
F30 Thickness Measurement Instrument Series
Thickness Range 3nm – 450µm Wavelength Range 190-1690nm Online Monitoring Thin-Film Deposition Measure deposition rates, film thickness optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time
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The 4PP contact four-point probe configuration is recommended for thin metal and ion implant layers, and the non-contact Eddy Current (EC) probe is recommended for thicker metal layers and soft or flexible conductive surfaces