Thickness Range 3nm – 450µm Wavelength Range 190-1690nm Online Monitoring Thin-Film Deposition Measure deposition rates, film thickness optical constants (n and k), and uniformity of semiconductors and dielectric layers in real-time
Inline Thickness MonitoringContact Us for Inquiry
Thickness Range 1nm – 150µm Wavelength Range 190-1700nm Simultaneous reflectance and transmittance Measure min/max and color.
Thickness Range 50nm – 70µm Wavelength Range 380-1050nm single and multiple layers Automobile Lighting Primer/hard coat
Thickness Range 1nm – 250µm Wavelength Range 190-1700nm Reflection Thickness and refractive index general-purpose film thickness measurement instruments
The 4PP contact four-point probe configuration is recommended for thin metal and ion implant layers, and the non-contact Eddy Current (EC) probe is recommended for thicker metal layers and soft or flexible conductive surfaces
Thickness Range 4nm – 250µm Wavelength Range 190-1690nm Microscopic For spot size as small as 1 micron. Microscopes attaches to the C mount adapter Exact monitoring of the film thickness measurement spot. Thickness and index measured in less than a second
The F3-sX family measures semiconductor and dielectric layers up to 3 mm thick. Such thick layers tend to be rougher and less uniform than thinner layers, which the F3-sX counters with a 10-µm-diameter measurement spot. With it the F3-sX family easily measures materials that are impossible to measure with other instruments.
Thickness Range- 100nm – 15µm/100nm – 30µm/200nm – 15µm/200nm – 30µm/ 500nm-30um